Purpose and area of application

   In the Thin Films Research Laboratory of Belarussian State University of Informatics and Radioelectronics, we carry on research and development of devices and technologies of thin film formation of the functional purpose. There was developed some groups of ion-plasma devices and technologies for the ion beam sputtering, magnetron sputtering, ion beam assisted deposition (IBAD), dual ion beam sputtering (DIBS), direct ion beam deposition (DIBD), ion beam assisted magnetron (IBAM) that are different

   In our University carry out the research and development the formation methods of thin films different purpose. In the scientific sphere of interests there are: developing the methods of deposition of metal films; arranging multilayer coatings of optic and optoelectronic purpose (SiO₂, TiO₂, Y₂O₃, Ta₂O₅, ITO films etc.) on large sized substrates; developing high-melting-point thin film compounds Si₃N₄, AlN, TiN, TiB₂ etc. As a other, we are researching in the process of production ultrahard coatings on the base of diamond like thin films, cubic boron nitride (c-BN), carbon nitride (β-C₃N₄) by IBAD and DIBS methods. The peculiarity of the deposition this class of films is the necessity of simultaneously ion bombardment of a growing film. We use this method to produce DLC films with good characteristics, for protective coatings in IR optics.

Systems and devices

Double beam ion source for dual ion beam sputtering

Ion sources for the ion beam assisted deposition (IS for IBAD) and ion cleaning.

Development of the magnetron sputtering systems and the ion beam assisted magnetron (IBAM) methods.