Purpose:

The boron-containing composition and sol-gel technology for receiving boron-containing coatings on the monocrystal silicon surface are developed. Coatings are used as a solid source of boron diffusion for integrated microchips production.

Technical characteristics:

• homogeneous transparent coating is formed after heat treatment at temperature 1200 ^oC
• Thickness of coatings: from 0,2 up to 1 micron
• Size of coatings: from 1 up to 11 cm in diameter
• Good adhesion to a silicon surface

Boron concentration in films, %	Temperature of processing, oC	Specific surface resistance of a silicon plate after film removal, Ohm/
30	1200	20-30
40		30-40

Technical and economical advantages:

Decrease in labour input of technological processes, reduction of power expenses in comparison with vacuum methods of coatings drawing. 5 times cost decrease of sol reception in comparison with analogues (Russia).

Commercial proposal:

Production and delivery of experimental batches of products, transfer of technology on the basis of license contract, assistance at implementation.