POLISHING SUSPENSION BASED ON THE SILICA DIOXIDE FOR POLISHING OF SEMI-CONDUCTING AND OTHER MATERIALS

Contact: V.Gaishun, Research Laboratory of advanced materials
phone (+375 232) 576436
fax (+375 232)  576357
e_mail:
http: www.gsu.by

Gomel State University
named after F.Skaryna

Address: 104, Sovetskaja str., 246019, Gomel,
Republic of Belarus

Purpose

Polishing suspensions represent ultradisperse colloid systems on a basis of the silica dioxide, stabilized by the organic and inorganic bases. Appearance - the matte liquid which is not containing extraneous mechanical inclusions, visible by the unaided eye. Suspensions are intended for polishing products of electronics. In particular, can be applied at a stage of finishing polishing of plates of monocrystal silicon.

Technical characteristics

The basic types of polishing suspensions: SPS - 54 - pure colloid silica dioxide without additives; SPS - 8 - for I stages of polishing of semi-conductor materials; SPS - 53, SPS - 55 - for II stage of polishing of semi-conductor materials.

Type of suspension SPS-55 SPS-53 SPS-8 SPS-81 SPS-54
Admixture, mass.%, Iron 0,0002 0,0002 0,0002 0,0002 0,0003
Admixture, mass.%, Sodium 0,4 0,4 0,0005 0,0005 0,0004
Admixture, mass.%, Potassium 0,00005 0,00005 0,00004 0,00004 0,00004
Stabilizing base NaOH, KOH NaOH, KOH Ethylendiamin Ethylendiamin -
Density, g/cm3 1,130-1,134 1,060-1,065 1,075-1,080 1,10-1,12 1,10-1,12
šĶ at 200C 9,5-10,9 9,5-10,9 11,8-12,0 12,5-12,8 6,5-7,0
Size of particles of SiO2, nm 50-100 10-40 10-40 50-100 50-100
Content of SiO2, mass.% 20,0 10,0 12,5 20,0 16,0
Viscosity, MPa*c 1,8 1,25 1,25 1,7 1,7
Stage of usage II stage II stage I stage I stage  
Recommended dilution 1:10 1:5 1:3 1:5  
šĶ after dilution 10,5-10,6 10,5-10,6 11,8-11,9 12,2-12,3  
Density after dilution, g/cm3 1,010 1,010 1,015 1,010 -
Recommended type of polishing segal or polyvel segal polytan polytan segal, polyvel, polytan, oth.
Serviceable life, months, at least 6 6 6 6 6

Advantages

Suspensions on a basis of nano-particles of pyrogen silica dioxide (A-50 and A-100 grade) have high stability, high efficiency, good selectivity, the minimal pollution by ions of metals and are suitable for use at a stage planarization of metal layers at manufacture of integrated microcircuits. The competitive price.

Industry implementation: SE "Kamerton", SIU "Integral"

 

 
 
For additional information please contact us at:
Regional marketing center phone: (+ 375 232) 577711
e-mail:
http: www.gsu.by/rcm/		 Gomel State University
named after F.Skaryna
phone: (+ 375 17) 2928342
fax: (+375 17) 2927183
e-mail:		 Ministry of Education for the Republic of Belarus